Method of fabricating antifuses in an integrated circuit device

Fishing – trapping – and vermin destroying

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437192, 437193, H01L 2144

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active

056704194

ABSTRACT:
Various improvements in the fabrication of an antifuse having silicon-amorphous silicon-metal layer structure are presented. Included are improved deposition techniques for the amorphous silicon layer. The improvements include steps for the fabrication of such an antifuse without the use of platinum and the resulting antifuse and contact structures.

REFERENCES:
patent: 3312871 (1967-04-01), Seki et al.
patent: 3558992 (1971-01-01), Heuner et al.
patent: 4569121 (1986-02-01), Lim et al.
patent: 4914055 (1990-04-01), Gordon et al.
patent: 5070384 (1991-12-01), McCollum et al.
Sze, VLSI Technology, 1988, McGraw-Hill pp. 377, 380-382.

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