Method of fabricating an X-ray exposure mask

Details Method of fabricating an X-ray exposure mask Method of fabricating an X-ray exposure mask

1989-02-24

1992-01-21

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

427255, 4272552, 430 5, C23C 1632, G03F 900

Patent

active

050826956

ABSTRACT:
A method of fabricating an X-ray exposure mask including the steps of forming a .beta.-SiC membrane by chemcial vapor deposition and simultaneously doping the membrane with at least one of phosphorous, boron, nitrogen and oxygen.

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patent: 4028149 (1977-06-01), Deines et al.
patent: 4847215 (1989-07-01), Hanaki et al.
patent: 4881257 (1989-11-01), Nakagawa
patent: 4941942 (1990-07-01), Bruns et al.
Arnold W. Yanof, "Electron-Beam, X-ray, and Ion-Beam Technology: Submicrometer Lithographies VII," pp. 10-15, Santa Clara, Calif., Mar. 2-4, 1988.
Patent Abstracts of Japan, vol. 12, No. 77, Mar. 10, 1988.

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