Method of fabricating a zinc oxide thin film

Details Method of fabricating a zinc oxide thin film Method of fabricating a zinc oxide thin film

1981-03-04

1982-06-22

O'Keefe, Veronica

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

252 629, 427100, C23C 1500

Patent

active

043361200

ABSTRACT:
A method of fabricating a zinc oxide thin film by a sputtering process, wherein a substance, such as boron, having an ion radius smaller than that of zinc is sputtered in an oxygen atmosphere. A body of zinc and a body of such a substance may be separately provided as targets of a cathode so that such separate targets may be simultaneously sputtered to thereby produce a thin film such as mentioned above. Alternatively, use may be made of a cathode provided with a zinc target having a substance buried therein which has an ion radius smaller than that of zinc.

REFERENCES:
patent: 3766041 (1973-10-01), Wasa et al.
patent: 4142124 (1979-02-01), Ogawa et al.
patent: 4151324 (1979-04-01), Ogawa et al.
patent: 4156050 (1979-05-01), Ogawa et al.
patent: 4164676 (1979-08-01), Nishiyawa et al.
K. Wasa et al., Proc. 6th Internl. Vacuum Congr. 1974, Japan J., Appl. Phys., Suppl. 2, Pt. 1, 1974, pp. 745-A, Surface Wave Transducers of ZnO.

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