Method of fabricating a semiconductor device having a capacitor

Details Method of fabricating a semiconductor device having a capacitor Method of fabricating a semiconductor device having a capacitor

1990-10-31

1992-11-17

Wilczewski, Mary

Fishing, trapping, and vermin destroying

437 47, 437 48, 437 49, 437 52, 437978, 437986, 437919, 148DIG14, 257307, 257308, H01L 2128, H01L 21306, H01L 21336

Patent

active

051643375

ABSTRACT:
A method of fabricating a semiconductor device is disclosed. The method comprises the steps of: forming a multi-layer film comprising two or more kinds of layers; performing first etching for patterning said multi-layer film under a first etching condition; and performing second etching for forming irregularities in the side faces of said patterned multi-layer film under a second etching condition.

REFERENCES:
patent: 4885261 (1989-12-01), Yoshikawa
patent: 5017505 (1991-05-01), Fujii et al.
patent: 5043298 (1991-08-01), Yamada et al.
patent: 5049517 (1991-09-01), Liu et al.
patent: 5053351 (1991-10-01), Fazan et al.
patent: 5071781 (1991-12-01), Seo et al.
patent: 5071783 (1991-12-01), Taguchi et al.
patent: 5077225 (1991-12-01), Lee
patent: 5102820 (1992-04-01), Chiba
S. Inoue et al., "A New Stacked Capacitor Cell with Thin Box Structure Storage Node," Extended Abstracts of 21st Conference on Solid State Devices and Materials, Tokyo, 1989, pp. 141-144.
T. Ema et al., "3-Dimensional Stacked Capacitor Cell for 16M and 64 Drams":, IEDM Tech. 1988 (IEEE) pp. 592-595.

Affiliated with

Also associated with

Rating

Method of fabricating a semiconductor device having a capacitor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating a semiconductor device having a capacitor , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating a semiconductor device having a capacitor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1171800