Method of fabricating a semiconductor device

Details Method of fabricating a semiconductor device Method of fabricating a semiconductor device

1996-01-24

1997-12-02

Nguyen, Tuan H.

Fishing, trapping, and vermin destroying

437 47, 437197, 437199, 437919, 148DIG14, H01L 2170

Patent

active

056935579

ABSTRACT:
A method of the invention for fabricating a semiconductor device includes the steps of: forming an oxide film having a non-uniform thickness on silicon; reducing at least a portion of the oxide film using gas containing a metal element, and growing a metal film containing the metal element on the silicon by reacting an exposed surface of the silicon with the gas; and removing the metal film.

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