Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-12-20
1999-01-19
Breneman, R. Bruce
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
216 24, 216 48, 216 62, 25049221, 25049222, 2504923, 430 5, 438717, 136257, G03F 900
Patent
active
058612262
ABSTRACT:
A method of fabricating a resonant micromesh filter having conductive antenna elements sized on the order of microns. The steps comprise of first creating an exposure mask having absorbing portions capable of stopping incident ions completely and transmitting portions incapable of stopping incident ions and through which incident ions can pass. The absorbing and transmitting portions form in the mask in the pattern of the antenna elements to be fabricated. Second, an exposure mask confronting an unpatterned filter is positioned. The unpatterned filter includes: a substrate, a thin metal foil mounted on the substrate, and a resist material covering the metal flow. Third, ions are passed through the exposure mask. The absorbing portions of the mask stop the ions and the transmitting portions allow the ions to pass through the mask and expose the section of the resist material of the filter in the pattern of the antenna elements. Fourth, the exposure mask is repositioned over an area of the unpatterned filter not previously exposed to incident ions. The third step is repeated. Then fourth step is repeated until a desired surface area of the unpatterned filter has been exposed. Last, the exposed unpatterned filter is processed to produce a conductive antenna array supported by a substrate.
REFERENCES:
patent: 4757208 (1988-07-01), McKenna et al.
patent: 4827138 (1989-05-01), Randall
patent: 5529862 (1996-06-01), Randall
patent: 5567551 (1996-10-01), Yahalom et al.
Horne William E.
Morgan Mark D.
Barnard Delbert J.
Breneman R. Bruce
Weingart Thomas W.
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