Method of fabricating a protective film by use of vacuum...

Details Method of fabricating a protective film by use of vacuum... Method of fabricating a protective film by use of vacuum...

2007-09-11

2007-09-11

Chen, Bret (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Electromagnetic or particulate radiation utilized

C427S596000

Reexamination Certificate

active

10676258

ABSTRACT:
In a method of fabricating a protective film, a vacuum ultraviolet radiation CVD (Chemical Vapor Deposition) system is used. The method includes providing a vacuum ultraviolet rays generator, a reactor provided with a platform for supporting a substrate, a heat retainer provided on the platform, and a window separating the vacuum ultraviolet rays generator from the reactor. Then, a step of feeding an organic stock gas from a gas feeder into the reactor while retaining the temperature of the substrate at a temperature of about equal to or less than 100° C. with the heat retainer is performed. Simultaneously, a step of irradiating the reactor with vacuum ultraviolet rays from the vacuum ultraviolet rays generator through the window is performed.

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Arkles, Barry C., “Silicon Nitride from Organosilazane Cyclic and Linear Prepolymers.” J. Electrochem. Soc., vol. 133, No. 1, pp. 233-234 (Jan. 1986).

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