Method of fabricating a programmable read-only memory cell incor

Metal working – Method of mechanical manufacture – Assembling or joining

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29575, 29576B, 29576C, 29576E, 29578, 29584, 29586, 148 15, 148174, 148187, 148DIG55, 357 2, 357 45, 357 51, 357 59, 365 94, 365103, 365105, 427 86, H01L 2120, H01L 21479

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045691215

ABSTRACT:
In fabricating a PROM cell, an electrical isolation mechanism (44 and 32) is formed in a semiconductive body to separate islands of an upper zone (36) of first type conductivity (N) in the body. A semiconductor impurity is introduced into one of the islands to produce a region (48) of opposite type conductivity (P) that forms a PN junction laterally bounded by the island's side boundaries. A highly resistive amorphous semiconductive layer (58) which is irreversibly switchable to a low resistive state is deposited above the region in such a manner as to be electrically coupled to the region. A path of first type conductivity extending from the PN junction through another of the islands to its upper surface is created in the body to complete the basic cell.

REFERENCES:
patent: 3990098 (1976-11-01), Mastrangelo
patent: 4146902 (1979-03-01), Tanimoto et al.
patent: 4174521 (1979-11-01), Neale
patent: 4203123 (1980-05-01), Shanks
patent: 4403399 (1983-09-01), Taylor
patent: 4420766 (1983-12-01), Kasten
patent: 4442507 (1984-04-01), Roesner
Tanimoto et al., "Novel 14 V Programmable . . . Poly-Si Resistor . . . ", IEEE J. Solid-State Circuits, vol. SC-17, No. 1, Feb. 1982, pp. 62-68.

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