Method of fabricating a planar waveguide structure

Details Method of fabricating a planar waveguide structure Method of fabricating a planar waveguide structure

1997-06-23

1999-11-09

Meeks, Timothy

Glass manufacturing

Processes of manufacturing fibers, filaments, or preforms

Process of manufacturing optical fibers, waveguides, or...

65391, 65413, 4271632, 427579, 4273762, 427379, C23C 1640

Patent

active

059791888

ABSTRACT:
Annealing a planar wave guide layer is critical because small structural imperfections lead to optical problems. Chemical vapor deposition of the layer tends to leave gaseous substances bonded to the deposit, which on being driven off by initial annealing warm-ups leave cavities requiring densification. Traditional annealing methods take several hours. This invention proposes a rapid heating of the layer to a temperature below the flow temperature, maintaining this temperature for about 30 to 300 seconds, then rapidly heating up further to a temperature close to or above the flow temperature, maintaining this temperature for about 30 to 300 seconds, then allowing the substrate and layer to cool rapidly to room temperature.

REFERENCES:
patent: 3868170 (1975-02-01), DeLuca

Affiliated with

Also associated with

Rating

Method of fabricating a planar waveguide structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating a planar waveguide structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating a planar waveguide structure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1441875