Method of fabricating a light emitting device, and light...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – In combination with or also constituting light responsive...

Reexamination Certificate

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Details

C257S013000, C257S051000, C257S097000, C257SE33021, C257SE33025, C257SE33027, C257SE33032

Reexamination Certificate

active

07145180

ABSTRACT:
In the fabricating of a light emitting device, a light emitting layer portion24and a current spreading layer7,respectively composed of a Group III-V compound semiconductor, are stacked on a single crystal substrate. The light emitting layer portion24is formed by a metal organic vapor-phase epitaxy process, and the current spreading layer7, on such light emitting layer portion24, is formed to have conductivity type of n-type by a hydride vapor-phase epitaxy process.

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patent: 2005/0110041 (2005-05-01), Boutros et al.
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patent: 5-275740 (1993-10-01), None
patent: 5275740 (1993-10-01), None
patent: 7-66455 (1995-03-01), None

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