Method of fabricating a high-voltage semiconductor device having

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437177, 437179, 437904, 148DIG139, 148DIG140, H01L 2144

Patent

active

051127741

ABSTRACT:
A semiconductor device such as a Schottky-barrier rectifier diode is disclosed which has a barrier electrode formed on a semiconductor substrate of gallium arsenide or the like. Formed around the barrier electrode is an annular resistive layer, typically of titanium oxide, creating a Schottky barrier at its interface with the semiconductor substrate. The resistive layer has a sheet resistance of more than 10 kilohms per square. In order to prevent preliminary breakdowns from taking place at the peripheral part of the resistive layer before final breakdown of the device, the sheet resistance of the resistive layer is made higher as it extends away from the barrier electrode. For the ease of manufacture, the resistive layer can be divided into two or more annular regions of distinctly different sheet resistances.

REFERENCES:
patent: 3599054 (1971-08-01), Lepselter
patent: 3616380 (1971-10-01), Lepselter
patent: 4157563 (1975-03-01), Bosselaar
patent: 4310570 (1982-01-01), Calviello
patent: 4312112 (1982-01-01), Calviello
patent: 4312113 (1982-01-01), Calviello
patent: 4495219 (1985-01-01), Kato et al.
patent: 4607270 (1986-08-01), Iesaka
Oxidation of Metals; Karl Hauffe; 1965; pp. 208-237; Plenum Press.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of fabricating a high-voltage semiconductor device having does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating a high-voltage semiconductor device having, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating a high-voltage semiconductor device having will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2426102

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.