Etching a substrate: processes – Forming or treating optical article
Patent
1996-05-15
1998-08-11
Powell, William
Etching a substrate: processes
Forming or treating optical article
216 41, 216 75, B44C 122
Patent
active
057923744
ABSTRACT:
A method of fabricating a color image sensor includes the steps of: (a) providing a gray scale image sensor with an array of photoelectric converting cells and a plurality of bonding pads on a substrate; (b) applying a first transparent layer on surface of the gray scale image sensor; (c) successively forming first, second and third color filter patterns on the first transparent layer, the first color filter pattern being disposed directly above a first group of the photoelectric converting cells, the second color filter pattern being disposed directly above a second group of the photoelectric converting cells, the third color filter pattern being disposed directly above a third group of the photoelectric converting cells; (d) coating a second transparent layer on the color filter patterns and on portions of the first transparent layer not covered by the color filter patterns; (e) depositing a metal layer on the second transparent layer; (f) patterning and etching the metal layer so as to remove portions of the metal layer, the second transparent layer and the first transparent layer which are directly above the bonding pads to expose the bonding pads; and (g) removing remaining portions of the metal layer.
REFERENCES:
patent: 5340619 (1994-08-01), Chen et al.
patent: 5364498 (1994-11-01), Chen
Jan Shang-Tarng
Wu Liang-Chung
Yang Thomas
Hualon Microelectronics Corporation
Powell William
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