Method of exposure by means of corpuscular beam shadow printing

Details Method of exposure by means of corpuscular beam shadow printing Method of exposure by means of corpuscular beam shadow printing

1978-05-08

1979-09-25

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250400, 250492R, A61K 2702

Patent

active

041692306

ABSTRACT:
A method of exposure of a target object by means of corpuscular beam shadow printing through a mask with several complementary zones wherein the beam, shiftable and tiltable about a point in the mask plane and arranged in parallel at a small distance from the target object, is first impinged upon a first of the complementary zones, then the object is shifted under a second of the complementary zones, and the positioning of the beam is changed so that any deviation of the actual position of the second area of the target object to be exposed from its nominal position is determined and compensated for by tilting the beam about a point substantially in the mask plane.

REFERENCES:
patent: 3326176 (1967-06-01), Sibley
patent: 3811069 (1974-05-01), O'Keefe
"High Speed Beam Pattern Generation" by G. L. Yarnell et al., Electrochemical Society, pp. 510, 511, Abstract #218.
"A Solution to the Mask Stencil Problem" by Heritage et al., Proc. Symposium on Electron & Ion Beam Science, Seventh Int. Conf., 1976, pp. 348-360.

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