Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1996-08-22
1998-12-01
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430296, 430942, 25049222, 250396R, 250398, G03F 900, G03F 720
Patent
active
058436030
ABSTRACT:
A method of evaluating a shaped beam generated by a charged beam writer, comprises the steps of: a first step of shaping line beams by dividing into 1
one side of the shaped beam having a dimension "a" in an x direction and a dimension "b" in a y direction perpendicular to the x direction, where n is the number of divisions; a second step of irradiating the shaped line beam upon a surface of the sample or the movable stage for a constant time or longer; a third step of shaping a beam by adding a bias value .delta. to each line beam width in the divided direction; a fourth step of irradiating the line beam obtained by adding the bias value to the shaped line beam upon a photosensitive substance on the sample surface for a constant time for exposure; a fifth step of repeating the fourth step exposure (n-1) times by shifting the line beam obtained by adding the bias value to the line beam, in the direction that one side of the shaped beam is divided into 1
, and developing the photosensitive substance, to obtain a pattern width .theta.; a sixth step of repeating the above first to fifth steps by changing the number of divisions n and the bias value .delta.; and a seventh step of obtaining a change rate .DELTA..theta./.DELTA.n of the pattern width .theta. relative to the number of divisions n for each bias value .delta., to obtain an offset drift rate on the basis of the obtained change rate and the bias value. The method can evaluate a beam offset drift rate between the set beam dimension and the actual beam dimension, so that a microscopic pattern can be formed at a high precision.
REFERENCES:
patent: 4543512 (1985-09-01), Nakasuji et al.
patent: 5391886 (1995-02-01), Yamada et al.
Ando Atsushi
Sugihara Kazuyoshi
Sunaoshi Hitoshi
Wada Hirotsugu
Kabushiki Kaisha Toshiba
Young Christopher G.
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