Method of evaluating optical beam source of exposure device,...

Details Method of evaluating optical beam source of exposure device,... Method of evaluating optical beam source of exposure device,...

2008-04-11

2011-12-20

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C250S205000, C355S053000, C355S067000, C355S077000, C430S030000

Reexamination Certificate

active

08081294

ABSTRACT:
A method of evaluating an exposure optical beam source of an exposure device used in an exposure process in manufacturing a semiconductor device is disclosed, in which the method includes dividing an exposure optical beam source into a plurality of unit optical beam sources in a unit size determined by an exposure device, acquiring a difference between an evaluation amount of a target pattern on a semiconductor substrate when a unit optical beam source is turned on and an evaluation amount of the target pattern on the semiconductor substrate when the unit optical beam source is turned off, and evaluating the exposure optical beam source by using the acquired difference as an index.

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patent: WO 2008061681 (2008-05-01), None

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