Photocopying – Contact printing – Frames
Patent
1982-06-23
1984-02-28
Wintercorn, Richard A.
Photocopying
Contact printing
Frames
354 4, 355 52, 355 77, 356394, G03B 2728, G01B 1100
Patent
active
044339119
ABSTRACT:
A method for evaluating the measure precision of patterns such as photoresist and etched ones, and a photomask therefor. The photomask according to the present invention has a mask pattern corresponding to a pattern desired to be formed in a substrate, and also has a measure precision evaluating pattern formed at an area different from where the mask pattern is present. The measure precision evaluating pattern comprises a first measure precision evaluating pattern which has a plurality of pairs of pattern elements opposite to each other with a predetermined distance interposed therebetween, and a second measure precision evaluating pattern which has a plurality of pairs of pattern elements overlapped each other in a predetermined measure and arranged opposite to each other to form a constricted portion. The distance or the measure of overlapped area between paired pattern elements is varied with every pair of pattern elements. This mask pattern is transcribed onto the substrate and a pair of pattern elements contacting each other without overlapping is found from the transcribed pattern. Dimensional change is found from the distance or the measure of overlapped area between the pair of photomask pattern elements corresponding to that pair of pattern elements which has been found from the transcribed pattern.
REFERENCES:
patent: 3716296 (1973-02-01), Springer et al.
patent: 3861798 (1975-01-01), Kobayashi et al.
patent: 3942896 (1976-03-01), Schneider et al.
patent: 3963354 (1976-06-01), Feldman et al.
patent: 3976383 (1976-08-01), Olsen
patent: 4005939 (1977-02-01), Stavalone
patent: 4183659 (1980-01-01), Brunner
patent: 4288157 (1981-09-01), Brunner
patent: 4349278 (1982-09-01), French et al.
IBM Tech. Disclosure Bulletin, "Tooling & Method for Inspection of Glassmaster Grid Locations", vol. 22, No. 6, Nov. 1979, L. D. Mayes & N. G. Stevens, pp. 2263-2264.
Endo Norio
Ogura Mitsugi
Sawada Shizuo
Tokyo Shibaura Denki Kabushiki Kaisha
Wintercorn Richard A.
LandOfFree
Method of evaluating measure precision of patterns and photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of evaluating measure precision of patterns and photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of evaluating measure precision of patterns and photomask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-757242