Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-03-22
2011-03-22
Rosasco, Stephen (Department: 1721)
Image analysis
Applications
Manufacturing or product inspection
C430S005000
Reexamination Certificate
active
07912275
ABSTRACT:
A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions, obtaining a dimensional difference between the measured dimension of the pattern portion and a target dimension of the pattern portion with respect to each of the pattern portions, grouping the dimensional difference obtained for each pattern portion into a plurality of groups in accordance with the inter-pattern distance obtained for each pattern portion, obtaining an evaluation value based on the dimensional difference in each group with respect to each of the groups, and evaluating the photo mask based on the evaluation value.
REFERENCES:
patent: 2006/0190875 (2006-08-01), Arisawa et al.
patent: 2003-241364 (2003-08-01), None
Arisawa Yukiyasu
Ikenaga Osamu
Itoh Masamitsu
Kanai Hideki
Mimotogi Shoji
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Rosasco Stephen
Ruggles John
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