Method of etching and cleaning objects

Details Method of etching and cleaning objects Method of etching and cleaning objects

2000-12-04

2008-09-02

Alanko, Anita K (Department: 1792)

Etching a substrate: processes

Nongaseous phase etching of substrate

C134S001300, C134S003000, C134S030000, C134S902000

Reexamination Certificate

active

07419614

ABSTRACT:
A method of etching and cleaning objects contained in a vessel, includes etching the objects by providing etching solution into the vessel, forcing out the etching solution from the vessel by providing pressurized gas into the vessel; cleaning the objects by providing cleaning solution into the vessel; and draining the cleaning solution from the vessel. By forcing out the etching solution with a pressurized gas such as nitrogen gas, there is no density difference of the etching solution in contact with the objects, leading to uniform etching of the objects.

REFERENCES:
patent: 4633893 (1987-01-01), McConnell et al.
patent: 6350322 (2002-02-01), Yates
patent: 03296218 (1991-12-01), None

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