Method of etching an organic anti-reflective coating

Details Method of etching an organic anti-reflective coating Method of etching an organic anti-reflective coating

1997-04-10

2000-03-21

Breneman, Bruce

Etching a substrate: processes

Forming or treating electrical conductor article

216 41, 216 47, 438725, C23F 100

Patent

active

060398884

ABSTRACT:
A method of etching an organic reflective coating which is suitable for minimizing the loss of a photoresist film and for improving the anisotropic etch profile is provided, including the steps of forming an organic anti-reflective coating on an etch layer, coating and patterning a photoresist material on the organic anti-reflective coating, and etching the organic anti-reflective coating in an O.sub.2 /CO plasma atmosphere.

REFERENCES:
patent: 5234990 (1993-08-01), Flaim et al.
patent: 5240554 (1993-08-01), Hori et al.
patent: 5476816 (1995-12-01), Mautz et al.
patent: 5753418 (1998-05-01), Tsa et al.
patent: 5773199 (1998-06-01), Linliu et al.

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