X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-03-29
2005-03-29
Church, Craig E. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
Reexamination Certificate
active
06873681
ABSTRACT:
The preferred orientation of a polycrystalline material is estimated using one diffraction peak. An orientation density distribution function ρ is assumed to be axisymmetric around a normal direction of the surface of a sample made of a polycrystalline material. The function ρ may be a Gaussian function or a March-Dollase function. An X-ray is incident upon the surface of the sample at an incident angle α and the intensity of a diffraction X-ray is measured. The change of intensity of the diffraction X-ray is measured with the incident angle α being changed to attain a measurement rocking curve. A theoretical diffraction X-ray intensity is calculated based on the orientation density distribution function ρ. The characteristic parameter of the function ρ is determined so that the theoretical rocking curve approaches the measurement rocking curve as closely as possible, whereby the orientation density distribution function ρ can be determined.
REFERENCES:
patent: 05-001999 (1993-01-01), None
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Omote Kazuhiko
Toraya Hideo
Church Craig E.
Frishauf Holtz Goodman & Chick P.C.
Rigaku Corporation
Yun Jurie
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