Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1977-04-22
1977-10-25
Demeo, Palmer C.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
313 62, 313362, 328234, H05H 708, H05H 1300
Patent
active
040557820
ABSTRACT:
When an easily ionized support gas such as xenon is added to the cold cathode in sources of the Oak Ridge Isochronous Cyclotron, large beam enhancements are produced. For example, .sup.20 Ne.sup.7+ is increased from 0.05 enA to 27 enA, and .sup.16 O.sup.5+ intensities in excess of 35 e.mu.A have been extracted for periods up to 30 minutes. Approximately 0.15 cc/min of the easily ionized support gas is supplied to the ion source through a separate gas feed line and the primary gas flow is reduced by about 30%.
REFERENCES:
patent: 3226598 (1965-12-01), Van Nimwegen
patent: 3566185 (1971-02-01), Gavin
patent: 3898496 (1975-08-01), Hudson et al.
"High Performance Heavy-ion source for cyclotrons", by E. D. Hudson et al., Article from 1971 particle accelerator conference, accelerator engineering and technology, Chicago, Illinois, Mar. 1-3, 1971, pp. 113-117.
Hudson Ed D.
Mallory Merrit L.
Carlson Dean E.
Deckelmann Louis M.
DeMeo Palmer C.
Hamel Stephen D.
The United States of America as represented by the United States
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