Method of ellipsometric measurement, an ellipsometer and device

Optics: measuring and testing – By polarized light examination – With polariscopes

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356369, G01N 2121

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active

056662009

ABSTRACT:
This invention relates to a method and a device for the ellipsometric measurement of physical parameters representative of a sample.
The measured values I.sub.om, I.sub.sm and I.sub.cm are calculated (51, 52) from the signal (50) which represents the measured intensity I(t).
In a first step (55, 57), initial theoretical values I.sub.st /I.sub.ot and I.sub.ct /I.sub.ot are produced from initial estimations (56) of the physical parameters. In a second step (58, 59) subsequent estimations (59) of physical parameters are determined from which subsequent theoretical values I.sub.st /I.sub.ot and I.sub.ct /I.sub.ot are deduced (55, 57). The second step is reiterated to an Nth estimation (59) of the physical parameters, so as to minimise the difference between the theoretical values and those measured.
The physical parameters are evaluated (54) in the course of the Nth estimation.

REFERENCES:
Drevillon et al, "Design of a new in situ spectroscopic phase modulated ellipsometer" SPIE vol. 1188 Multichamber and In-Situ Processing of Electronic Materials (1989) pp. 174-184 (no month) 1989.
"A Reflectance Anisotropy Spectrometer for Real-Time Measurements," O. Acher et al., Rev. Sci. Instrum., vol. 63, No. 11, Nov. 1992, pp. 5332-5339.
"Virtual Interface Method for In Situ Ellipsometry of Films Grown on Unknown Substrates," F. K. Urban, III et al., Journal of Vacuum Science & Technology, Part A, vol. 11, No. 4, Jul./Aug. 1993, pp. 976-980.
"In Situ Spectral Ellipsometry for Real-Time Thickness Measurement: Etching Multilayer Stacks," Steven A. Henck et al., Journal of Vacuum Science & Technology, Part A, vol. 11, No. 4, Jul./Aug. 1993, pp. 1179-1185.
"In Situ Characterization of Plasma-Deposited a-C:H Thin Films by Spectroscopic Infrared Ellipsometry," A. Friedl et al., Review of Scientific Instruments, vol. 65, No. 9, Sep. 1994, pp. 2882-2889.
"Ellipsometric data processing: an efficient method and an analysis of the relative errors", by Charlot et al., Applied Optics/vol. 24, No. 20, Oct. 15, 1985, pp. 3368-3373.
"High-speed spectral ellipsometry for in situ diagnostics and process control", by W.M. Duncan et al., J. Vac. Sci. Technol. B. 12(4), Jul./Aug. 1994, pp. 2779-2784.
"Phase Modulated Ellipsometry From The Ultraviolet To The Infrared: In Situ Application To The Growth Of Semiconductors", by Drevillon, Prog. Crystal Growth & Charact. 1993, vol. 27, (no month).

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