Optics: measuring and testing – By polarized light examination – With polariscopes
Patent
1996-02-27
1997-09-09
Rosenberger, Richard A.
Optics: measuring and testing
By polarized light examination
With polariscopes
356369, G01N 2121
Patent
active
056662009
ABSTRACT:
This invention relates to a method and a device for the ellipsometric measurement of physical parameters representative of a sample.
The measured values I.sub.om, I.sub.sm and I.sub.cm are calculated (51, 52) from the signal (50) which represents the measured intensity I(t).
In a first step (55, 57), initial theoretical values I.sub.st /I.sub.ot and I.sub.ct /I.sub.ot are produced from initial estimations (56) of the physical parameters. In a second step (58, 59) subsequent estimations (59) of physical parameters are determined from which subsequent theoretical values I.sub.st /I.sub.ot and I.sub.ct /I.sub.ot are deduced (55, 57). The second step is reiterated to an Nth estimation (59) of the physical parameters, so as to minimise the difference between the theoretical values and those measured.
The physical parameters are evaluated (54) in the course of the Nth estimation.
REFERENCES:
Drevillon et al, "Design of a new in situ spectroscopic phase modulated ellipsometer" SPIE vol. 1188 Multichamber and In-Situ Processing of Electronic Materials (1989) pp. 174-184 (no month) 1989.
"A Reflectance Anisotropy Spectrometer for Real-Time Measurements," O. Acher et al., Rev. Sci. Instrum., vol. 63, No. 11, Nov. 1992, pp. 5332-5339.
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"In Situ Spectral Ellipsometry for Real-Time Thickness Measurement: Etching Multilayer Stacks," Steven A. Henck et al., Journal of Vacuum Science & Technology, Part A, vol. 11, No. 4, Jul./Aug. 1993, pp. 1179-1185.
"In Situ Characterization of Plasma-Deposited a-C:H Thin Films by Spectroscopic Infrared Ellipsometry," A. Friedl et al., Review of Scientific Instruments, vol. 65, No. 9, Sep. 1994, pp. 2882-2889.
"Ellipsometric data processing: an efficient method and an analysis of the relative errors", by Charlot et al., Applied Optics/vol. 24, No. 20, Oct. 15, 1985, pp. 3368-3373.
"High-speed spectral ellipsometry for in situ diagnostics and process control", by W.M. Duncan et al., J. Vac. Sci. Technol. B. 12(4), Jul./Aug. 1994, pp. 2779-2784.
"Phase Modulated Ellipsometry From The Ultraviolet To The Infrared: In Situ Application To The Growth Of Semiconductors", by Drevillon, Prog. Crystal Growth & Charact. 1993, vol. 27, (no month).
Benferhat Ramdane
Drevillon Bernard
Kildemo Morten
Instruments S.A.
Rosenberger Richard A.
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