Method of eliminating a fern-like pattern during electroplating

Details Method of eliminating a fern-like pattern during electroplating Method of eliminating a fern-like pattern during electroplating

1988-01-25

1989-04-18

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

C25D 706

Patent

active

048224570

ABSTRACT:
A method is provided for eliminating a fern-like pattern on metal strip being electroplated with metal or metal-alloy coatings. The method includes contacting the to be plated surface of the strip with sufficient additional electrolyte solution to substantially eliminate non-uniformity of a film carried thereon from a prior treatment, such additional electrolyte being in contact with said surface for at least 0.1 second prior to and continuing until arrival of said surface at a point directly facing the adjacent edge of a first electrically energized anode within an electrolytic cell for the plating thereof.

REFERENCES:
patent: 1751960 (1930-03-01), Veenstra
patent: 1987962 (1935-01-01), Leupold
patent: 2793993 (1957-05-01), Stock et al.
patent: 3563863 (1971-02-01), Vierow
patent: 3591467 (1971-07-01), Carter
patent: 3691030 (1972-09-01), Stroszynski
patent: 3796643 (1974-03-01), Swalheim
patent: 4401523 (1983-08-01), Avellone

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