Chemistry: electrical and wave energy – Processes and products
Patent
1975-08-06
1977-01-04
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
204 43G, 204 46G, 204 47, 204275, C25D 502
Patent
active
040010937
ABSTRACT:
A method of electroplating precious metal in localized areas. The deposits obtained are usually nonuniform and limited to only those areas where coating is actually required thus offering considerable economic savings. The method uses shaped anodes approaching the cathodes very closely, high parallel flow rates of electrolyte and high current densities of at least 100 milliamperes per cm..sup.2 in order to electroplate the precious metal quickly. The preferred precious metal is gold. The method is applied to the coating of electronic circuits and components such as connectors and switches.
REFERENCES:
patent: R28267 (1974-12-01), Rackus et al.
patent: 2088498 (1937-07-01), Tull
patent: 3644181 (1972-02-01), Donaldson
Frederick A. Lowenheim, "Modern Electroplating", pp. 208-209, (1963).
Koontz Donald Eldridge
Landau Uziel
Bell Telephone Laboratories Incorporated
Kaplan G. L.
Nilsen Walter G.
LandOfFree
Method of electroplating precious metals in localized areas does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of electroplating precious metals in localized areas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of electroplating precious metals in localized areas will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-251527