Method of electron beam exposure

Radiant energy – Means to align or position an object relative to a source or...

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2504922, G01N 2100, G01N 2300

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active

044437048

ABSTRACT:
A method of electron beam exposure in which a plurality of sets of reference values for setting the conditions for electron beam exposure are found in relation to a plurality of sizing marks which are successively arrayed at positions in the vicinity of the pattern area of a specimen, and the exposure condition values corresponding to registration marks on the surface of the specimen are derived from these said reference values for setting the exposure conditions.

REFERENCES:
patent: 4119854 (1978-10-01), Tanaka et al.
patent: 4137459 (1979-01-01), Albrecht et al.
patent: 4199688 (1980-04-01), Ozasa

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