Chemistry: electrical and wave energy – Processes and products
Patent
1986-11-03
1987-06-16
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
204 431, C25D 356
Patent
active
046734716
ABSTRACT:
The invention provides a Cr alloy plating bath comprising a sulfate bath consisting essentially of divalent Cr ion and trivalent Cr ion in a total amount of between 1.5 to 2.0 mol/l, cation of one or more than two selected from the group consisting of potassium ion, sodium ion and ammonium ion in a total amount of 1.5 to 2.5 mol/l, and metal ion of one or more than two selected from the group consisting of Fe, Ni and Co, in an amount of less than 0.6 mol/l, wherein the invention provides stable plating, without requiring a separation between electrolytes with a diaphragm, and provides good deposition at high current efficiencies.
REFERENCES:
patent: 2766196 (1956-10-01), Yoshida
patent: 2822326 (1958-02-01), Safranek
patent: 2927066 (1960-03-01), Schaer
patent: 2990343 (1961-06-01), Safranek
patent: 3111464 (1963-11-01), Safranek et al.
patent: 3954574 (1976-05-01), Gyllenspetz et al.
patent: 4054494 (1977-10-01), Gyllenspetz et al.
patent: 4093521 (1978-06-01), Renton et al.
Abner Brenner, "Electrodeposition of Alloys", vol. I and II, pp. 118-119, and 120, (1963).
Kagechika Hiroshi
Kammel Roland
Tonouchi Akira
Kaplan G. L.
Kojima Moonray
Nippon Kokan Kabushiki Kaisha
LandOfFree
Method of electrodepositing a chromium alloy deposit does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of electrodepositing a chromium alloy deposit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of electrodepositing a chromium alloy deposit will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-682355