Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1975-07-31
1977-09-06
Rutledge, L. Dewayne
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
29574, 29576R, 29577, 29580, 29583, 148187, 148191, 357 34, 357 40, 357 48, 357 55, 357 56, H01L 2120, H01L 2166, H01L 2178
Patent
active
040466051
ABSTRACT:
A monolithic integrated circuit includes a vertical transistor having a low collector resistance with high current handling ability. The integrated circuit comprises a P type epitaxial layer grown on an N type substrate with both deep and shallow N type diffusions made into the P type layer. In the high current vertical transistor region with the deep N type diffusion, the deep diffusion penetrates the P layer to the N type substrate, whereas in the other transistor the shallow diffusion does not penetrate to the substrate. An N epitaxial layer is grown on the P type layer and thereafter normal processing techniques are used to form the base and emitter regions for the devices including the high current transistor which has its collector electrically coupled to the substrate.
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Hollins Brian E.
Nelson Carl T.
Higgins Willis E.
National Semiconductor Corporation
Rutledge L. Dewayne
Saba W. G.
Woodward Gail W.
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