Method of drying passivated micromachines by dewetting from a li

Details Method of drying passivated micromachines by dewetting from a li Method of drying passivated micromachines by dewetting from a li

1997-05-30

2000-09-05

Lusignan, Michael

Stock material or miscellaneous articles

Composite

Of silicon containing

216 74, 216 96, 310309, 427309, 427352, 427354, 4274432, 427 58, B32B 904

Patent

active

061140449

ABSTRACT:
A method of fabricating a micromachine includes the step of constructing a low surface energy film on the micromachine. The micromachine is then rinsed with a rinse liquid that has a high surface energy, relative to the low surface energy film, to produce a contact angle of greater than 90.degree. between the low surface energy film and the rinse liquid. This relatively large contact angle causes any rinse liquid on the micromachine to be displaced from the micromachine when the micromachine is removed from the rinse liquid. In other words, the micromachine is dried by dewetting from a liquid-based process. Thus, a separate evaporative drying step is not required, as the micromachine is removed from the liquid-based process in a dry state. The relatively large contact angle also operates to prevent attractive capillary forces between micromachine components, thereby preventing contact and adhesion between adjacent microstructure surfaces. The low surface energy film may be constructed with a fluorinated self-assembled monolayer film. The processing of the invention avoids the use of environmentally harmful, health-hazardous chemicals.

REFERENCES:
patent: 5403665 (1995-04-01), Alley et al.
patent: 5411769 (1995-05-01), Hornbeck
patent: 5512374 (1996-04-01), Wallace et al.
patent: 5683591 (1997-11-01), Offenberg

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