Method of dry etching, method of manufacturing magnetic...

Details Method of dry etching, method of manufacturing magnetic... Method of dry etching, method of manufacturing magnetic...

2005-06-21

2009-02-10

Olsen, Allan (Department: 1792)

Etching a substrate: processes

Forming or treating article containing magnetically...

C216S041000, C360S135000, C428S835000

Reexamination Certificate

active

07488429

ABSTRACT:
The recording layer (to-be-etched layer), a main mask layer, and a sub mask layer are formed in this order over a substrate, and the sub mask layer is processed into a predetermined concavo-convex pattern. Next, parts of the main mask layer under the concave portions are removed by reactive ion etching using oxygen or ozone as the reactive gas. Parts of the recording layer under the concave portions are also removed by dry etching, whereby the recording layer is shaped into the concavo-convex pattern. The main mask layer is chiefly made of carbon. The sub mask layer is made of a material having an etching rate lower than that of carbon with respect to the reactive ion etching in the step of processing the main mask layer.

REFERENCES:
patent: 5240554 (1993-08-01), Hori et al.
patent: 5378316 (1995-01-01), Franke et al.
patent: 5789320 (1998-08-01), Andricacos et al.
patent: 5910864 (1999-06-01), Hira et al.
patent: 5991118 (1999-11-01), Kasamatsu et al.
patent: 6014296 (2000-01-01), Ichihara et al.
patent: 6324032 (2001-11-01), Ohtsuka et al.
patent: 6348405 (2002-02-01), Ohuchi
patent: 6383907 (2002-05-01), Hasegawa et al.
patent: 6689622 (2004-02-01), Drewes
patent: 6748865 (2004-06-01), Sakurai et al.
patent: 6806096 (2004-10-01), Kim et al.
patent: 6875664 (2005-04-01), Huang et al.
patent: 6884630 (2005-04-01), Gupta et al.
patent: 6884733 (2005-04-01), Dakshina-Murthy et al.
patent: 6977108 (2005-12-01), Hieda et al.
patent: 6984529 (2006-01-01), Stojakovic et al.
patent: 6989332 (2006-01-01), Bell et al.
patent: 7050326 (2006-05-01), Anthony
patent: 2003/0164354 (2003-09-01), Hsieh et al.
patent: 2004/0016918 (2004-01-01), Amin et al.
patent: 2004/0191577 (2004-09-01), Suwa et al.
patent: 2004/0224512 (2004-11-01), Sato et al.
patent: 2004/0229470 (2004-11-01), Rui et al.
patent: 2004/0259355 (2004-12-01), Yin et al.
patent: 2005/0112506 (2005-05-01), Czech et al.
patent: 2005/0118817 (2005-06-01), Fujita et al.
patent: 2005/0157376 (2005-07-01), Huibers et al.
patent: 2005/0175791 (2005-08-01), Hattori et al.
patent: 2005/0181604 (2005-08-01), Sperlich et al.
patent: 2005/0213239 (2005-09-01), Hibi et al.
patent: 2005/0214583 (2005-09-01), Ito et al.
patent: 2005/0221512 (2005-10-01), Ito et al.
patent: 2005/0243467 (2005-11-01), Takai et al.
patent: 2005/0284842 (2005-12-01), Okawa et al.
patent: 2005/0287397 (2005-12-01), Soeno et al.
patent: 2006/0046200 (2006-03-01), Abatchev et al.
patent: 2006/0065286 (2006-03-01), Rana et al.
patent: 2007/0161251 (2007-07-01), Tran et al.
patent: A-60-047422 (1985-03-01), None
patent: A-62-247522 (1987-10-01), None
patent: A-62-293721 (1987-12-01), None
patent: A-02-143413 (1990-06-01), None
patent: 06020230 (1994-01-01), None
patent: A-09-097419 (1997-04-01), None
patent: A-2000-322710 (2000-11-01), None
patent: 2001185531 (2001-07-01), None

Affiliated with

Also associated with

Rating

Method of dry etching, method of manufacturing magnetic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of dry etching, method of manufacturing magnetic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of dry etching, method of manufacturing magnetic... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4060390