Method of drawing patterns through electron beam exposure utiliz

Details Method of drawing patterns through electron beam exposure utiliz Method of drawing patterns through electron beam exposure utiliz

1997-12-02

1999-08-10

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, 430942, G03F 900, G03C 500

Patent

active

059357444

ABSTRACT:
In a method of drawing patterns by an electron beam exposure apparatus, a target pattern is divided into subpatterns and one of the subpatterns is sequentially selected. The dimensions of the selected subpattern are compared with dimensions of a reference electron beam which are determined in accordance with design dimensions. When at least one of the dimensions of the selected subpattern is not larger than the corresponding one of the dimensions of the reference electron beam, dimensions of the use electron beam for the selected subpattern are estimated. Also, the use exposure quantity for the selected subpattern is determined based on the estimated dimensions of the use electron beam for the selected subpattern. Then, the use electron beam is irradiated to the subpattern with the use exposure quantity.

REFERENCES:
patent: 5700604 (1997-12-01), Okino

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