Method of doping interconnections for electrochemical cells

Details Method of doping interconnections for electrochemical cells Method of doping interconnections for electrochemical cells

1988-04-15

1990-01-23

Kalafut, Stephen J.

Metal working

Method of mechanical manufacture

Electrical device making

429 31, 429 32, 427105, 427115, 427253, 4272552, H01M 600, B05D 512, C23C 1600

Patent

active

048955760

ABSTRACT:
A dense, electronically conductive interconnection layer 26 is bonded on a porous, tubular, electronically conductive air electrode structure 16, optionally supported by a ceramic support 22, by (A) forming a layer of oxide particles of at least one of the metals Ca, Sr, Co, Ba or Mg on a part 24 of a first surface of the air electrode 16, (B) heating the electrode structure, (C) applying a halide vapor containing at least lanthanum halide and chromium halide to the first surface and applying a source of oxygen to a second opposite surface of the air electrode so that they contact at said first surface, to cause a reaction of the oxygen and halide and cause a dense lanthanum-chromium oxide structure to grow, from the first electrode surface, between and around the oxide particles, where the metal oxide particles get incoporated into the lanthanum-chromium oxide structure as it grows thicker with time, and the metal ions in the oxide particles diffuse into the bulk of the lanthamum-chromium oxide structure, to provide a dense, top, interconnection layer 26 on top of the air electrode 16. A solid electrolyte layer 18 can be applied to the uncovered portion of the air electrode, and a fuel electrode 20 can be applied to the solid electrolyte, to provide an electrochemical cell 10.

REFERENCES:
patent: 4597170 (1986-07-01), Isenberg
patent: 4631238 (1986-12-01), Ruka

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