Method of doping a semiconductor body

Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal

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148186, 148187, 252 623E, H01L 21223

Patent

active

039986756

ABSTRACT:
A method of doping a semiconductor body comprises applying to a surface of the semiconductor body a layer through which the doping material can diffuse and provide the layer with a reducing agent to reduce the doping material to its elemental form at areas where doping is not required.

REFERENCES:
patent: 3313663 (1967-04-01), Yeh et al.
patent: 3542609 (1970-11-01), Bohne et al.
patent: 3566517 (1971-03-01), Brown et al.
patent: 3615936 (1971-10-01), Batz

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