Gas separation: processes – Magnetic separation
Reexamination Certificate
2005-05-17
2010-11-23
Smith, Duane (Department: 1797)
Gas separation: processes
Magnetic separation
C095S030000, C096S002000, C096S175000
Reexamination Certificate
active
07837762
ABSTRACT:
In the field of immersion lithography, it is known to provide a liquid between an optical exposure system and a wafer carrying layers of photosensitive material to be irradiated with a pattern by the optical exposure system. However, bubbles are known to form or exist in the liquid, sometimes close to a surface of the wafer resulting in scattering of light emitted from the optical exposure system. The scattering causes the pattern recorded in the layers of photosensitive material to be corrupted, resulting in defective wafers. Therefore, the present invention provides a bubble displacement apparatus comprising a drive signal generator for driving a force generator arranged to generate a force in response to a drive signal generated by the drive signal generator. The force generated urges the bubble away from the surface.
REFERENCES:
patent: 7433016 (2008-10-01), Streefkerk et al.
patent: 2002/0136971 (2002-09-01), Ito et al.
patent: 2005/0048223 (2005-03-01), Pawloski et al.
patent: 2006/0216650 (2006-09-01), Harayama
patent: 1486827 (2004-12-01), None
Cooper Kevin
Warrick Scott
Freescale Semiconductor Inc.
Smith Duane
Theisen Douglas J
LandOfFree
Method of distancing a bubble and bubble displacement apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of distancing a bubble and bubble displacement apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of distancing a bubble and bubble displacement apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4171747