Method of directly manufacturing reticle patterns on chrome-coat

Details Method of directly manufacturing reticle patterns on chrome-coat Method of directly manufacturing reticle patterns on chrome-coat

1980-06-23

1981-12-15

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430275, 430313, 430314, 430318, 156318, G03C 500, H05K 306

Patent

active

043060064

ABSTRACT:
Reticle patterns are formed upon a chrome-coated plate by means of forming a resist pattern upon the surface of the chrome having a predetermined thickness at which resonant absorption phenomenon occurs and a maximum rate of development is achieved. The resist layer should comply with the relationship ##EQU1## where .lambda. is representative of the chosen wavelength of the light source used to expose the resist, n is representative of the index of refraction of the resist for that chosen wavelength, and k is an integer ranging from 0 to 4. Resists with such thicknesses establish stationary wave phenomena in order to permit use of very thin resist layers. The value of k should preferably be one, for a resist thickness of about 1800 A where n equals 1.63 and .lambda. is about 4050 A for xenon lamps. The resist is then exposed by a pattern generator, developed, and a positive or negative pattern is formed by means of etching or a lift-off technique, respectively.

REFERENCES:
patent: 3877810 (1975-04-01), Feldstein
patent: 3923568 (1975-12-01), Bersin
patent: 3986876 (1976-10-01), Abita
patent: 4092442 (1978-05-01), Agnihotri et al.
An Introduction to Photofabrication using Kodak Photoresists, Kodak Publication P-79, 1966, pp. 20 and 21.
Proceedings of the Second Seminar on Microminiaturization, Apr. 4 and 5, 1966 by G. F. Damon, pp. 36-43.

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