Method of diffusing plurality of dopants simultaneously from vap

Details Method of diffusing plurality of dopants simultaneously from vap Method of diffusing plurality of dopants simultaneously from vap

1984-09-28

1990-07-03

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437165, 437987, H01L 21223

Patent

active

049391038

ABSTRACT:
This invention relates to the manufacture of semiconductor devices and more particularly to a method of diffusing an impurity layer into a substrate. The disclosed method comprises the steps of placing a body of semiconductor in a vacuum doping chamber, evacuating air from the chamber, subjecting the body to a dopant in the form of a gas or vapor while simultaneously heating the chamber to at least the diffusion temperature. The diffusion process is controlled by monitoring and controlling the pressure and the temperature of the dopant gas in the chamber. The diffusion method can also be carried out with the further admittance of a reactive gas or with the further admittance of a second dopant gas and a reactive gas together.

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