Method of diffusing ions into quartz glass

Details Method of diffusing ions into quartz glass Method of diffusing ions into quartz glass

1973-06-14

1976-05-18

Kellogg, Arthur D.

Glass manufacturing

Processes

With chemically reactive treatment of glass preform

65 33, 65110, C03C 2100

Patent

active

039574768

ABSTRACT:
Quartz glass element, such as a diffusion tube useful in the production of semiconductor elements, capable of forming an outer layer of uniformly fine crystalline silica such as cristobalite or tridymite when heated to a temperature at which such crystalline silica forms containing crystallization promoting nuclei having a rate of diffusion in quartz glass less than that of sodium at elevated temperatures. Such nuclei are present in the outer half of the element wall and the maximum concentration of such nuclei is at the surface of the element and then diminishes inwardly. When the quartz glass element is exposed to elevated temperatures, the nuclei promotes the formation of the outer layer of uniformly fine crystalline silica which imparts thermal dimensional stability for extended periods of use at elevated temperatures.

REFERENCES:
patent: 3464880 (1969-09-01), Rinehart
patent: 3773487 (1973-11-01), Plumat et al.
patent: 3776809 (1973-12-01), Baumler et al.

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