Method of die bonding semiconductor chip

Metal fusion bonding – Process – Metal to nonmetal with separate metallic filler

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228195, 228231, 228254, B23K 3102, H01L 2150

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active

052420990

ABSTRACT:
In a manufacturing method for a semiconductor device, first, a diffused layer of a soldering material is provided previously either on the reverse surface of a die or on the obverse surface of a die pad. Then, a diffusing layer is formed on either surface of the diffused layer. The diffusing layer between the die and the die pad is brought into contact with the die and die pad, and then these components are heated. The die is thereby and fully bonded to the die pad, even when the diffusing layer, which is an initial bonding layer, is made thinner. Because the time for the diffusing layer to diffuse can be shortened, the time for installing the die can also be shortened.

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patent: 4772935 (1988-09-01), Lawler et al.
patent: 4922322 (1990-05-01), Mathew
patent: 5038996 (1991-08-01), Wilcox et al.
IBM Technical Disclosure Bulletin, "Transient Liquid Phase Bonding Process", vol. 32, No. 4A, pp. 273, 274, Sep. 1989.
Transactions of the Metallurgical Society of AIME, ". . . SLID Bonding", Bernstein and Bartholomew, vol. 236, pp. 405-412, Mar. 1966.

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