Method of developing photosensitive material and method of...

Details Method of developing photosensitive material and method of... Method of developing photosensitive material and method of...

2011-02-01

2011-02-01

Laballe, Clayton E (Department: 2862)

Photography

Fluid-treating apparatus

Having photographic medium feed

C396S464000

Reexamination Certificate

active

07878722

ABSTRACT:
An in-liquid turn bar disposed in a developing tank is set to discharge developer from plural slit-shaped discharge openings of a first cylindrical member such that a discharge rate of the developer per 1 m of the photosensitive material turning member is from 50 to 200 l/min (litter/minute). Regulating plates protruding from a surface of the first cylindrical member are provided at both transverse ends of the first cylindrical member. The amount of the developer discharged from both transverse ends of a photosensitive web is controlled by the regulating plates, thereby adjusting a gap between the first cylindrical member and the photosensitive web. Accordingly, the gap between the photosensitive web and the in-liquid turn bar is substantially uniform in a transverse direction, and thus the photosensitive web is turned without contact with the in-liquid turn bar.

REFERENCES:
patent: 3186326 (1965-06-01), Schmidt
patent: 3521802 (1970-07-01), Bossons
patent: 3873317 (1975-03-01), Kato et al.
patent: 4138047 (1979-02-01), Sherman
patent: 4342413 (1982-08-01), Reba
patent: 6131847 (2000-10-01), Theilacker et al.
patent: 2002/0195009 (2002-12-01), Boucher
patent: 8-245028 (1996-09-01), None
patent: 2006-332459 (2006-12-01), None
patent: 2007041057 (2007-02-01), None
English Machine translation of JP 2006-332459A.

Affiliated with

Also associated with

Rating

Method of developing photosensitive material and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of developing photosensitive material and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of developing photosensitive material and method of... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2645227