Method of developing a resist film and a resist development...

Details Method of developing a resist film and a resist development... Method of developing a resist film and a resist development...

2007-02-20

2007-02-20

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

Reexamination Certificate

active

11359483

ABSTRACT:
The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.

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Statement explaining the revelance of the cited references.

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