Method of developing a resist film and a resist development...

Details Method of developing a resist film and a resist development... Method of developing a resist film and a resist development...

2006-04-25

2006-04-25

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S611000, C430S434000

Reexamination Certificate

active

07033089

ABSTRACT:
The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.

REFERENCES:
patent: 2004/0096210 (2004-05-01), Takasu et al.
patent: 2004/0123484 (2004-07-01), Yoshikawa et al.
patent: 2004/0198066 (2004-10-01), Verhaverbeke
patent: 2005/0008980 (2005-01-01), Arena-Foster et al.
patent: 1-220828 (1989-09-01), None
patent: 7-284739 (1995-10-01), None
patent: 9-139374 (1997-05-01), None
patent: 11-87306 (1999-03-01), None

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