Method of developing a photoresist pattern and a developing appa

Details Method of developing a photoresist pattern and a developing appa Method of developing a photoresist pattern and a developing appa

1998-04-20

2000-09-19

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Screen other than for cathode-ray tube

430 30, 430325, 396570, G02B 520, G02F 11335, G03E 730

Patent

active

061209457

ABSTRACT:
A method of developing photoresist films formed on a plurality of substrates utilizes a circulated developing fluid to sequentially develop the photoresist films with developing accuracy and controllability secured. It includes the steps of measuring the conductivity and the absorbance of the developing fluid, calculating the pH value or its equivalence thereof in accordance with the conductivity and absorbance measured in the measuring step; and maintaining the pH value or its equivalence to be in a predetermined range. There are also disclosures as to an apparatus for developing photoresist films, and a color filter and a liquid crystal display device manufactured by the method of developing photoresist films.

REFERENCES:
patent: 5223881 (1993-06-01), Nakagawa et al.

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