Method of determining the radiation dose in a lithographic appar

Details Method of determining the radiation dose in a lithographic appar Method of determining the radiation dose in a lithographic appar

1997-02-18

1999-06-08

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

439 22, G01B 1100, G03F 900

Patent

active

059108479

ABSTRACT:
A method and apparatus for forming a pattern on a substrate (w), either or not via a mask pattern (c), are described. The radiation dose can be measured accurately and reliably by measuring a latent image of a new, asymmetrical test mark (TM) by means of an optical alignment device present in the apparatus or associated therewith, this latent image being formed by means of production radiation (PB) in the radiation-sensitive layer on the substrate.

REFERENCES:
patent: 5674650 (1997-10-01), Dirksen et al.
"Latent Image Metrology for Production Wafer Steppers", P. Dirksen et al, SPIE, vol. 2440, pp. 701-711, 1995.

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