Method of determining the number of active diamonds on a...

Abrading – Abrading process – With tool treating or forming

Reexamination Certificate

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C451S028000, C451S041000, C451S443000, C451S287000, C451S288000, C073S007000

Reexamination Certificate

active

07410411

ABSTRACT:
The invention relates to a method for determining the number of active diamonds on a conditioning disk. In particular, the method comprises (a) contacting a diamond conditioner disk with a hard surface, wherein the diamond-containing side of the diamond conditioning disk is facing the hard surface, (b) moving the diamond conditioner disk under a load across the hard surface so as to cause any active diamonds present on the diamond-containing side of the diamond conditioner disk to leave a mark corresponding to each active diamond, and (c) counting the marks to determine the number of active diamonds on the diamond conditioner disk.

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patent: 7011566 (2006-03-01), Chandrasekaran
patent: 7081037 (2006-07-01), Berman et al.
patent: 7175510 (2007-02-01), Skocypec et al.
patent: 2004/0038623 (2004-02-01), Chandrasekaran
patent: 2 326 166 (1998-12-01), None
Bubnick, et al., “Effects of Diamond Size and Shape on Polyurethane Pad Conditioning,”Abrasive Technology TechView,(2004). Retrieved on Oct. 13, 2006 from: http://www.abrasive-tech.com/pdf/effectsdiamond.pdf.
Bubnick, et al., “Optimizing Diamond Conditioning Disks for the Tungsten CMP Process,”Abrasive Technology TechView,(2002). Retrieved on Oct. 13, 2006 from: http://www.abrasive-tech.com/pdf/tcmptungsten.pdf.
Goers, et al., “Measurement and Analysis of Diamond Retention in CMP Diamond Pad Conditioners” (Mar. 14, 2000).
Dyer, et al., “Characterizing CMP Pad Conditioning Using Diamond Abrasives”,Micro,(Jan. 2002).
Zimmer, et al., “Key Factors Influencing Performance Consistency of CMP Pad Conditioners,”Diabond® Technical Articles, Morgan Advanced Ceramics,Retrieved on Oct. 13, 2006 from: http://www.diamonex.com/diabond—key—factors.htm.
Thear, et al., “Improving Productivity Through Optimization of the CMP Conditioning Process,”Technical Articles, Morgan Advanced Ceramics(Feb. 17, 2004). Retrieved on Oct. 13, 2006 from: http://www.morganadvancedceramics.com/articles/cmp—optimization.htm.

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