Method of determining the amount of projection exposure

Details Method of determining the amount of projection exposure Method of determining the amount of projection exposure

1999-02-17

2000-12-05

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

382145, G03F 900

Patent

active

06156463&

ABSTRACT:
A method of determining the amount of exposure is provided, in which a projection exposure is carried out onto a photoresist film using a photomask, having a plurality of openings with transmittance values different from one opening to the next stepwise, and through which light beams are irradiated for the exposure. Subsequently, the openings from which the photoresist is completely removed are observed and a lowest light transmittance value is found among the corresponding openings, to thereby the minimum amount of the exposure E.sub.th for removing the photoresist film is determined. The minimum amount of the projection exposure is found by exposing a plurality of portions with a single exposure step, and the determination of amount of the exposure becomes feasible with relative ease.

REFERENCES:
patent: 5976741 (1999-11-01), Ziger et al.
Dammel, Ralph, "Diazonaphthoquinone-based Resists", 1993, pp. 10-12.

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