Method of determining stray radiation lithographic...

Details Method of determining stray radiation lithographic... Method of determining stray radiation lithographic...

2005-03-01

2005-03-01

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

C355S067000, C355S077000

Reexamination Certificate

active

06862076

ABSTRACT:
A system and method for determining the stray radiation condition of a projection system, is presented herein. The invention includes providing a detector with a detector aperture coincident with the image plane of the projection system, measuring a reference parameter in accordance with the projection beam intensity, measuring a stray radiation parameter of an image of an isolated feature and calculating a coefficient representative of the stray radiation condition of the projection system based on the measured stray radiation parameter and the reference parameter. The extent of the detector aperture fits within the extent of a notional shape, which is defined by first scaling down the shape of the feature and subsequently displacing each line element constituting the edge of the scaled down shape, parallel to itself, over a distance of at least λ/NA in a direction perpendicular to that line element.

REFERENCES:
patent: 6716646 (2004-04-01), Wright et al.
patent: 20030169345 (2003-09-01), Rykowski et al.
Joseph P. Kirk, “Scattered Light in Photolithographic Lenses”, Optical/Laser Microlithography VII (1994), SPIE vol. 2197, pp. 566-572.

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