Method of determining regularity of a pattern array to enable po

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

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250548, 250557, 356400, G01B 1100

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active

051536781

ABSTRACT:
A method of determining regularity of a pattern array on a substrate to enable sequential positioning of patterns of the array relative to a reference position includes the step of calculating a reliability degree regarding a measured value of a pattern position, and the step of determining the regularity of the pattern array on the basis of the calculated reliability degree, and a design value and the measured value of the pattern position.

REFERENCES:
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4710026 (1987-12-01), Magome et al.
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4918320 (1990-04-01), Hamasaki et al.

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