Method of determining fluorine

Details Method of determining fluorine Method of determining fluorine

1983-01-12

1987-05-19

Chin, Peter

Chemistry: analytical and immunological testing

Halogen containing

436172, G01N 2176

Patent

active

046668578

ABSTRACT:
A method of determining the concentration of fluorine in a gas flow is provided, in which the gas flow is passed through a gas discharge space in which fluorine atoms are formed and after leaving the space the formed fluorine atoms in the gas flow are reacted with a substance to emit luminescent radiation and the intensity of the radiation is measured. Elemental silicon is chosen as a material for the substance and is provided so as to be optically separated from the space.

REFERENCES:
Mogab et al., "Plasma Etching of Si and SiO.sub.2 -the Effect of Oxygen Additions to CF.sub.4 Plasmas", J. Appl. Phys., 49(7), Jul. 1978.

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