Method of determining an orientation of a crystal lattice of...

Details Method of determining an orientation of a crystal lattice of... Method of determining an orientation of a crystal lattice of...

2007-05-04

2008-09-02

Yun, Jurie (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S073000, C378S076000

Reexamination Certificate

active

07421060

ABSTRACT:
According to an illustrative embodiment disclosed herein, a semiconductor structure comprising a first crystalline substrate and a second crystalline substrate is provided. The semiconductor structure is irradiated with a radiation. Both the first crystalline substrate and the second crystalline substrate are exposed to the radiation. At least one diffraction pattern of a crystal lattice of the first crystalline substrate and a crystal lattice of the second crystalline substrate is measured. A relative orientation of the crystal lattice of the first crystalline substrate and the crystal lattice of the second crystalline substrate is determined from the at least one diffraction pattern.

REFERENCES:
patent: 6977986 (2005-12-01), Beanland et al.

Affiliated with

Also associated with

Rating

Method of determining an orientation of a crystal lattice of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of determining an orientation of a crystal lattice of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of determining an orientation of a crystal lattice of... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3985678