Method of determining an illumination profile and device...

Details Method of determining an illumination profile and device... Method of determining an illumination profile and device...

2005-09-12

2008-09-16

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S311000

Reexamination Certificate

active

07425397

ABSTRACT:
An illumination profile useable in a lithographic apparatus to match the output of a target lithographic apparatus is obtained by obtaining a reference CD vs. pitch function for the lithographic projection apparatus at at least a plurality of pitch values using a reference illumination profile; obtaining a target CD vs. pitch function at at least the plurality of pitch values; generating a CD sensitivity map for the lithographic projection apparatus for a given pattern; calculating from the reference CD vs. pitch function, the target CD vs. pitch function and the CD sensitivity map, a suitable illumination profile to be used in said lithographic apparatus to expose said given pattern.

REFERENCES:
patent: 2001/0026448 (2001-10-01), Koizumi et al.

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