Method of determining an exposure dose of a photosensitive lacqu

Details Method of determining an exposure dose of a photosensitive lacqu Method of determining an exposure dose of a photosensitive lacqu

1986-09-22

1988-09-27

Dees, Jose' G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430394, 430396, 430494, G03C 500

Patent

active

047741589

ABSTRACT:
On a photosensitive lacquer present on a substrate, details having a line width in the range of 0.5 .mu.m-2 .mu.m have to be accurately reproduced in the lacquer layer. In order to determine the exposure does or time, the lacquer layer is exposed through a raster pattern comprising alternately transparent and non-transparent line-shaped regions of the desired width. The raster pattern is then laterally displaced over a distance equal to the line width in a direction at right angles to the longitudinal direction of the lines, after which an exposure is carried out again at the same dose. The process is repeated at a few areas, but at a different exposure dose, after which a reference exposure dose is determined in that it is ascertained what dose is required to just dissolve entirely the photosensitive lacquer layer after development.

REFERENCES:
patent: 3998639 (1976-12-01), Feldman et al.
patent: 4021239 (1977-05-01), Ogawa

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